Nanochannel process and structure for bio-detection

US9059135B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Jingwei Bai · Beijing, CN
• Evan G. Colgan · Chestnut Ridge, US
• Christopher V. Jahnes · Upper Saddle River, US
• Stanislav Polonsky · Putnam Valley, US

Key dates

• Filing date: Aug 18, 2013
• Grant date: Jun 16, 2015
• Expiry date: Oct 10, 2033

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10D84/038
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Nanochannel sensors and methods for constructing nanochannel sensors. An example method includes forming a sacrificial line on an insulating layer, forming a dielectric layer, etching a pair of electrode trenches, forming a pair of electrodes, and removing the sacrificial line to form a nanochannel. The dielectric layer may be formed on insulating layer and around the sacrificial line. The pair of electrode trenches may be etched in the dielectric layer on opposite sides of the sacrificial line. The pair of electrodes may be formed by filling the electrode trenches with electrode material. The sacrificial line may be removed by forming a nanochannel between the at least one pair of electrodes.