Photoresist composition, coated substrate, and method of forming electronic device
US9063420B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 16, 2013 |
| Grant date | Jun 23, 2015 |
| Priority date | — |
| Expiry date | Aug 12, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition includes a polymer with repeat units having the structurewherein each occurrence of R1 and R2 is independently hydrogen, unsubstituted or substituted C1-18 linear or branched alkyl, unsubstituted or substituted C3-18 cycloalkyl, unsubstituted or substituted C6-18 aryl, or unsubstituted or substituted C3-18 heteroaryl; and R1 and R2 are optionally covalently linked to each other to form a ring that includes —R1—C—R2—; each occurrence of Ar1, Ar2, and Ar3 is independently an unsubstituted or substituted C6-18 arylene, or unsubstituted or substituted C3-18 heteroarylene. In addition to the polymer, the photoresist composition includes a photoactive component selected from photoacid generators, photobase generators, photoinitiators, and combinations thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.