System and method for non-contact metrology of surfaces
US9068904B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 18, 2012 |
| Grant date | Jun 30, 2015 |
| Priority date | — |
| Expiry date | Jun 10, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M11/0264
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A non-contact metrology system utilizes a display that can be programmed with a plurality of targets. The display targets shine on a specular surface and the reflected targets are detected by an imaging device. Based on the display pattern and the expected location of the reflected pattern, it is possible to characterize the reflective surface. The displayed pattern can be a regular array of targets and the reflected pattern detected by the imaging device is an irregular display of targets whose locations are based on the particular display pattern, the location of the display system and imaging device and the nature of the surface. Deviations of the actual location of targets from the expected location of targets is indicative of unexpected variations in the surface. Alternatively, the display has an irregular pattern of targets such that the reflected signals result in a regularly spaced array detected by the imaging device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.