Mask having assist pattern
US9069258B2 · kind B2 · utility
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12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 15, 2013 |
| Grant date | Jun 30, 2015 |
| Priority date | — |
| Expiry date | Oct 29, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/42
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A mask may include a circuit area and a pixel area. The circuit area includes a circuit pattern. The pixel area includes a pixel pattern which is extended in a length direction and an assist pattern which is at an end portion of the pixel pattern and adjacent to the circuit area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.