Patterning of nanostructures

US9070556B2 · kind B2 · utility

Assignee

• Massachusetts Institute of Technology · US

Inventors

• Joseph M. Jacobson · Newton, US
• David Kong · Lexington, US
• Vikas Anant · Cambridge, US
• Ashley Salomon · Chicago, US
• Saul Griffith · San Francisco, US
• Will DelHagen · Cambridge, US
• Vikrant Agnihotri · Cambridge, US

Key dates

• Filing date: Jan 20, 2015
• Grant date: Jun 30, 2015
• Expiry date: Jan 20, 2035

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S977/891
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A technique for forming nanostructures including introducing a plurality of molecular-size scale and/or nanoscale building blocks to a region near a substrate and simultaneously scanning a pattern on the substrate with an energy beam, wherein the energy beam causes a change in at least one physical property of at least a portion of the building blocks, such that a probability of the portion of the building blocks adhering to the pattern scanned by the energy beam is increased, and wherein the building blocks adhere to the pattern to form the structure. The energy beam and at least a portion of the building blocks may interact by electrostatic interaction to form the structure.