Low-dopant polycrystalline silicon chunk
US9073756B2 · kind B2 · utility
4Cited by
3References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 11, 2012 |
| Grant date | Jul 7, 2015 |
| Priority date | — |
| Expiry date | Jun 27, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/037
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The invention provides a polycrystalline silicon chunk having a concentration of 1-50 ppta of boron and 1-50 ppta of phosphorus at the surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.