Patent · US Active

Low-dopant polycrystalline silicon chunk

US9073756B2 · kind B2 · utility

4Cited by
3References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 11, 2012
Grant dateJul 7, 2015
Priority date
Expiry dateJun 27, 2033

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B33/037
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

The invention provides a polycrystalline silicon chunk having a concentration of 1-50 ppta of boron and 1-50 ppta of phosphorus at the surface.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.