Method for manufacturing holographic bi-blazed grating
US9075194B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 10, 2012 |
| Grant date | Jul 7, 2015 |
| Priority date | — |
| Expiry date | Oct 10, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2260/63
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for manufacturing a holographic bi-blazed grating. Two blaze angles of the holographic bi-blazed grating are respectively a blaze angle A and a blaze angle B, and oblique-ion beam etching is performed on two grating areas A and B respectively by using a photoresist grating (12) and a homogeneous grating (14) as masks, thereby implementing different controls on the two blaze angles, and avoiding a secondary photoresist lithography process. Because when manufacturing the homogeneous grating (14), the time of positive ion beam etching can be controlled, so that the groove depth of the homogeneous grating (14) is controlled accurately. In addition, because the homogeneous grating mask and a substrate (10) are made of the same material, etching rates of the two are consistent, so that the accurate control of blaze angles can be implemented.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.