Patent · US Active

High-resolution microscopy and photolithography devices using focusing micromirrors

US9075227B2 · kind B2 · utility

18Cited by

3References

14Claims

0Family size

Assignee

ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL) · CH

Inventors

Bastien Rachet · Lausanne, CH
Fabrice Merenda · Lausanne, CH
René Salathe · Ecublens, CH

Key dates

Filing date	Jan 23, 2010
Grant date	Jul 7, 2015
Priority date	—
Expiry date	Mar 9, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG02B26/0833
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention relates to large-field high-resolution microscopy and photolithography setups operating with polychromatic light. It includes the use of a plurality of focusing micromirrors.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.