Patent · US Active

Substrate treatment installation

US9076635B2 · kind B2 · utility

372Cited by

1References

8Claims

0Family size

Assignee

VON ARDENNE Anlagentechnik GmbH · DE

Inventors

Harald Gross · Neuschönborn, DE
Erwin Zschieschang · Dresden, DE

Key dates

Filing date	Apr 27, 2012
Grant date	Jul 7, 2015
Priority date	—
Expiry date	Jul 30, 2032

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67115
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A substrate treatment installation includes an installation chamber and a light source for the exposure of substrates to light. The light source is arranged in the interior of the substrate treatment installation and includes at least one discharge lamp arranged in a housing, which is permeable to light at least in sections and has a vacuum-tight cavity for accommodating the lamp, and also at least one reflector element arranged in spatial proximity to the at least one lamp and having an electrical connection.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.