Photoresist composition, method of manufacturing a polarizer and method of manufacturing a display substrate using the same
US9076697B2 · kind B2 · utility
1Cited by
3References
14Claims
0Family size
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Key dates
| Filing date | Aug 7, 2014 |
| Grant date | Jul 7, 2015 |
| Priority date | — |
| Expiry date | Aug 7, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133548
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photoresist composition includes about 65% by weight to about 80% by weight of a mono-functional monomer, about 5% by weight to about 20% by weight of a di-functional monomer, about 1% by weight to about 10% by weight of a multi-functional monomer including three or more functional groups, about 1% by weight to about 5% by weight of a photoinitiator, and less than about 1% by weight of a surfactant, each based on a total weight of the photoresist composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.