Extreme ultraviolet light source devices
US9078334B2 · kind B2 · utility
3Cited by
16References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2013 |
| Grant date | Jul 7, 2015 |
| Priority date | — |
| Expiry date | Dec 13, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0025
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An extreme ultraviolet light (EUL) source device is disclosed, the device comprising: a chamber in which a gas flow and a droplet stream are provided; a droplet generator through which target material is changed into the droplet stream; and a shroud positioned along the droplet stream, the shroud shielding the droplet stream from the gas flow, wherein the droplet stream is irradiated by laser to produce plasma and generate an extreme ultraviolet light. The shroud includes flow guide surface features that guide accumulated target material away from a collector mirror that reflects and focuses the EUL.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.