Method for treating residues containing salt, produced during the production of amino-functional organosilanes

US9079926B2 · kind B2 · utility

Assignee

• EVONIK DEGUSSA GMBH · DE

Inventors

• Philipp Albert · Bad Kötzting, DE
• Eckhard Just · Rheinfelden (Baden), DE

Key dates

• Filing date: Apr 20, 2009
• Grant date: Jul 14, 2015
• Expiry date: Jul 8, 2030

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C07F7/1892
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

The invention relates to a method for treating an ammonium halogenide and/or residue containing organic aminhydrohalogenides, produced during the production of an amino-functional organosilane of general formula (I) R2N[(CH2)2NH]z(Z)Si(R″)n(OR′)3-n (Ia), wherein the production of the amino-functional organosilane according to formula (Ia) is based on the conversion of a halogen-functional organosilane of general formula (II) X—Z—Si(R″)n(OR′)3-n (II), with excess ammonia or an organic amine of general formula (III) RNH[(CH2)2NH]zR (III) and subsequently separating and treating the raw product and the resulting residue containing salt. The treatment consists of adding an essentially non-polar organic solvent and an aqueous lye to the residue. The mixture is reacted, subsequently the aqueous phase is separated from the organic phase, the organic solvent contained in the organic phase is removed from said phase and the residual organic phase is recovered.