Patent · US Active

Method of forming a non-random copolymer

US9080000B2 · kind B2 · utility

13Cited by
14References
23Claims
0Family size

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Key dates

Filing dateFeb 2, 2010
Grant dateJul 14, 2015
Priority date
Expiry dateMar 17, 2031

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08L53/00
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A non-random copolymer is formed, and its structure controlled, using a method including the step of combining a mixture of a first radical polymerizable compound and an organoborane initiator, a second radical polymerizable compound, and an organoborane decomplexing agent, at a rate sufficient to form the non-random copolymer. The non-random copolymer may be a silicon gradient polymer. To form the silicon gradient copolymer, the first and second radical polymerizable compounds are polymerized in the presence of the organoborane initiator and the organoborane decomplexing agent. The silicon gradient copolymer has a polymer backbone consisting of organic moieties and has at least one silicon containing pendent group.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.