Use of heptylpolyglycosides for solubilising non-ionic surfactants in aqueous acidic cleaning compositions, and aqueous acidic cleaning compositions comprising same

US9080132B2 · kind B2 · utility

Assignee

• SOCIETE D'EXPLOITATION DE PRODUITS POUR LES INDUSTRIES CHIMIQUES SEPPIC · FR

Inventors

• Marie-Francoise Gayral Chirac · Castres, FR
• Sebastien Kerverdo · Saint-Mandé, FR
• Jerome Guilbot · Castres, FR
• Herve Rolland · Castres, FR

Key dates

• Filing date: May 14, 2012
• Grant date: Jul 14, 2015
• Expiry date: May 14, 2032

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C11D1/722
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

A composition (C) of formula (I): R1—O-(G)p-H (I). G is a reducing sugar, R1 is a heptyl radical, p is a decimal number, and 1<p≦5. Composition (C) is a mixture of compounds of five formulae: R1—O-(G)1-H (I1), R1—O-(G)2-H (I2), R1—O-(G)3-H (I3), R1—O-(G)4-H (I4), and R1—O-(G)5-H (I5). The sum of their molar proportions a1, a2, a3, a4 and a5 equals 1, and p=a1+2a2+3a3+4a4+5a5. Composition (C) is a solubilising agent in an acidic aqueous composition for non-ionic surfactant(s) according to: R—(O—CH(R′)—CH2)n—(O—CH2—CH2)m—O—H (II). R is a C8-C14 aliphatic radical, R′ is CH3 or CH2CH3, 0≦n≦15, 0≦m≦15, and (n+m)>0. Also, compositions (C1) having 0.2-40% mass of composition(s) (C) and 0.2-80% mass non-ionic surfactant(s) of formula (II), which may be used to clean hard surfaces.