Layer depositing device and method for operating it
US9080237B2 · kind B2 · utility
2Cited by
6References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 29, 2008 |
| Grant date | Jul 14, 2015 |
| Priority date | — |
| Expiry date | Mar 27, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B25/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A layer depositing device comprises a chamber (10) having a substrate carrier (12) for receiving at least one substrate (13) to be coated, and a process gas space (11), comprising a partition (23) that separates a first segment (21) of the process gas space (11) from a second segment (22) of the process gas space (11). The layer depositing device has a device (44) for moving the substrate (13) relative to the partition (23).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.