Interferometric systems and methods
US9081193B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 21, 2013 |
| Grant date | Jul 14, 2015 |
| Priority date | — |
| Expiry date | Jun 21, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/451
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Optical systems and methods including interferometric systems and methods are disclosed herein. In some embodiments, the present invention relates to a system comprising at least one light source including a deep ultraviolet light source, a lens device, a beam splitter, and a camera device. The lens device receives first light, directs at least some of that light toward a target location, receives reflected light therefrom, and directs at least some of the reflected light toward a further location, where at least part of a light path between the deep ultraviolet light source and the target location is other than at a high vacuum. The camera device is positioned at either the further location or an additional location, whereby an image is generated by the camera device based upon at least a portion of the reflected light. Also encompassed herein are interferometric lithography and optical microscopy systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.