Method of optimizing lithography tools utilization
US9081306B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2012 |
| Grant date | Jul 14, 2015 |
| Priority date | — |
| Expiry date | Jan 11, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67155
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithography cluster includes at least two lithography cells having a first lithography cell and a second lithography cell, an interface unit configured to integrate with the first lithography cell and the second lithography cell. The first lithography cell includes a first track and a first exposing tool and a second lithography cell includes a second track and a second exposing tool. The interface station includes a first interface buffer configured to couple the first track, a second interface buffer configured to couple the second track, a conveyor configured to couple the first interface buffer and the second interface buffer, and a robot configure to move along the conveyor, where in the robot transfers a substrate between functions of multiple functions within the first lithography cell, the second lithography cell, or between the first lithography cell and the second lithography cell.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.