Patent · US Active

Semiconductor device and method for manufacturing semiconductor device

US9082707B2 · kind B2 · utility

0Cited by
0References
17Claims
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Assignee

Inventors

Key dates

Filing dateMay 9, 2011
Grant dateJul 14, 2015
Priority date
Expiry dateAug 29, 2031

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L2924/19107
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A semiconductor device includes a semiconductor element substrate, wherein an electrode pattern is formed on one surface of an insulating substrate and a back-surface electrode is formed on the other surface of the insulating substrate; a stress-relaxation adhesive layer made of resin that covers at least a part of a portion of the surface of the insulating substrate where the electrode pattern and the back-surface electrode are not formed; and a semiconductor element affixed, using a bonding material, to the surface of the electrode pattern opposite the insulating substrate, and a first sealing resin member which covers the semiconductor element and the semiconductor element substrate, and a modulus of elasticity of the stress-relaxation adhesive layer is lower than that of the first sealing resin member.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.