Patent · US Active

Method, system, and apparatus for lift gas distribution

US9084977B2 · kind B2 · utility

0Cited by
11References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 29, 2011
Grant dateJul 21, 2015
Priority date
Expiry dateApr 5, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T137/8593
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

A method, system, and apparatus for lift gas distribution are disclosed. According to one embodiment, a lift gas distributor comprises a plate having a surface and an underside, the plate having a first diameter; a center section of the plate having a second diameter, wherein the first diameter is larger than the second diameter; a predetermined number of holes having a third diameter drilled into the surface of the plate, the holes drilled at an angle, the holes evenly distributed in the center section; and a plurality of tubes welded onto the underside of the plate, each tube having a predetermined length, wherein each tube is welded onto each hole. Lift gas passes through the tubes and holes into a reactor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.