Patent · US Active

Resistance measurement system and method of using the same

US9085464B2 · kind B2 · utility

1Cited by
197References
20Claims
0Family size

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Key dates

Filing dateMar 7, 2012
Grant dateJul 21, 2015
Priority date
Expiry dateApr 13, 2032

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N27/04
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A quality control system for the manufacture of carbon nanostructure-laden substrates includes a resistance measurement module for continuously measuring resistance of the carbon nanostructure (CNS)-laden substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.