Patent · US Active

Manufacturing method of high-purity chloropolysilane

US9085465B2 · kind B2 · utility

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2References
13Claims
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Key dates

Filing dateDec 6, 2012
Grant dateJul 21, 2015
Priority date
Expiry dateDec 6, 2032

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B33/10742
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A chlorination reaction can be carried out at a relatively low temperature by heating a mixture of granular metallic silicon and metallic copper or a copper compound in an inert atmosphere even when the metallic silicon has a high purity and does not contain aluminum and titanium and that chloropolysilane of high purity can be obtained by further adding metallic silicon as needed after the chlorination reaction is started.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.