Method and apparatus for resistivity measurements
US9085959B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 22, 2010 |
| Grant date | Jul 21, 2015 |
| Priority date | — |
| Expiry date | Sep 2, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01V3/30
- WIPO fieldCivil engineering
- WIPO sectorOther fields
Abstract
An apparatus for measuring a resistivity of a formation comprising an instrumented bit assembly coupled to a bottom end of the apparatus. At least one first electromagnetic wave antenna transmits an electromagnetic wave signal into the formation. At least one second electromagnetic wave antenna located on the instrumented bit assembly and longitudinally spaced apart from the at least one first electromagnetic wave antenna receives the electromagnetic wave signal transmitted through the formation. Electronic circuitry is operably coupled to the at least one second electromagnetic wave antenna to process the received signal to determine a resistivity of the formation proximate the instrumented bit assembly.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.