Active matrix substrate, and display panel
US9087749B2 · kind B2 · utility
1Cited by
1References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2011 |
| Grant date | Jul 21, 2015 |
| Priority date | — |
| Expiry date | Dec 25, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D30/6743
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An active matrix substrate (20a) includes a gate electrode (25) formed on an insulating substrate (10a), and a planarizing film (26) formed on the gate electrode (25) and made of a baked SOG material. The gate electrode (25) is a multilayer film including a first conductive film (27) formed on the insulating substrate (10a) and made of a metal except copper, a second conductive film (28) formed on the first conductive film (27) and made of copper, and a third conductive film (29) formed on the second conductive film (28) and made of the metal except copper.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.