Patent · US Active

Transistor structures and methods of fabrication thereof

US9088000B2 · kind B2 · utility

0Cited by
2References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 16, 2013
Grant dateJul 21, 2015
Priority date
Expiry dateJan 30, 2034

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K85/211
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

An electronic device is presented, such as a thin film transistor. The device comprises a patterned electrically-conductive layer associated with an active element of the electronic device. The electrically-conductive layer has a pattern defining an array of spaced-apart electrically conductive regions. This technique allows for increasing an electric current through the device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.