Additives to improve the performance of a precursor source for cobalt deposition
US9090964B2 · kind B2 · utility
1Cited by
3References
26Claims
0Family size
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Key dates
| Filing date | Dec 19, 2013 |
| Grant date | Jul 28, 2015 |
| Priority date | — |
| Expiry date | Jan 30, 2034 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Methods of forming cobalt films utilizing a cobalt precursor comprising an additive are described. Those methods may include adding an additive to a cobalt precursor, wherein the cobalt precursor is located in an ampoule that is coupled with a deposition tool, and then forming a cobalt film using the cobalt precursor comprising the additive. Non-volatile decomposition products of the cobalt precursor are solubilized in the ampoule.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.