Patent · US Active

System for defect detection and repair

US9092842B2 · kind B2 · utility

3Cited by

10References

4Claims

0Family size

Assignee

Sharp Laboratories of America, Inc. · US

Inventors

Xinyu Xu · Shanghai, CN
Chang Yuan · Los Gatos, US

Key dates

Filing date	Aug 4, 2011
Grant date	Jul 28, 2015
Priority date	—
Expiry date	Feb 7, 2034

Classification

Technology area (CPC G)Physics
CPC primaryG06T2207/30141
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

A system for identifying a repair cut location for a defect in a liquid crystal device includes receiving an input image, a defect mask image, and a landmark structure image. The system determines a repair cut location, based upon the input image, the defect mask image, and the landmark structure image, for a liquid crystal device proximate the defect. The determination may be based upon a type of said defect, a cause of said defect, a position of said defect, and a spatial relationship of the defect and a structure of the landmark image.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.