Glass substrate for flat panel display and manufacturing method thereof
US9096459B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 29, 2012 |
| Grant date | Aug 4, 2015 |
| Priority date | — |
| Expiry date | Nov 23, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/133302
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A flat panel display glass substrate includes a glass comprising, in mol %, 55-80% SiO2, 3-20% Al2O3, 3-15% B2O3, and 3-25% RO (the total amount of MgO, CaO, SrO, and BaO). The contents in mol % of SiO2, Al2O3, and B2O3 satisfy a relationship (SiO2+Al2O3)/(B2O3)=7.5-17. The strain point of the glass is 665° C. or more. The devitrification temperature of the glass is 1250° C. or less. The substrate has a heat shrinkage rate of 75 ppm or less. The rate of heat shrinkage is calculated from the amount of shrinkage of the substrate measured after a heat treatment which is performed at a rising and falling temperature rate of 10° C./min and at 550° C. for 2 hours by the rate of heat shrinkage (ppm)={the amount of shrinkage of the substrate after the heat treatment/the length of the substrate before the heat treatment}×106.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.