Patent · US Active

Block copolymer for manufacturing nanowire and method for manufacturing thereof

US9096705B2 · kind B2 · utility

2Cited by
1References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 21, 2012
Grant dateAug 4, 2015
Priority date
Expiry dateMay 9, 2033

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB82Y40/00
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A block copolymer for manufacturing a nanowire and a method of manufacturing the same are disclosed. The block copolymer and the method of manufacturing a nanowire using the same are used to fabricate a nanowire having a diameter of less than or equal to 30 nm and a porous nanowire having a diameter within the same range and pores with a diameter of less than or equal to 10 nm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.