Block copolymer for manufacturing nanowire and method for manufacturing thereof
US9096705B2 · kind B2 · utility
2Cited by
1References
4Claims
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Key dates
| Filing date | Sep 21, 2012 |
| Grant date | Aug 4, 2015 |
| Priority date | — |
| Expiry date | May 9, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A block copolymer for manufacturing a nanowire and a method of manufacturing the same are disclosed. The block copolymer and the method of manufacturing a nanowire using the same are used to fabricate a nanowire having a diameter of less than or equal to 30 nm and a porous nanowire having a diameter within the same range and pores with a diameter of less than or equal to 10 nm.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.