Optical design techniques for providing favorable fabrication characteristics
US9097649B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2013 |
| Grant date | Aug 4, 2015 |
| Priority date | — |
| Expiry date | Feb 20, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/285
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed are methods and techniques for providing favorable fabrication characteristics for optical elements. One method includes providing a desired integrated computational element (ICE) design comprising a plurality of layers, each layer having a design thickness, randomizing the design thickness of each layer of the desired ICE design to simulate a fabrication error in each layer, thereby generating a plurality of randomized ICE designs, calculating a standard error of calibration between each randomized ICE design and the desired ICE design, correlating the standard error of calibration between a given layer of the desired ICE design and the fabrication error of each corresponding layer of each randomized ICE design, and ranking the plurality of layers of the desired ICE design based on the sensitivity to changes in the standard error of calibration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.