System and method for scanning a pulsed laser beam
US9101446B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 11, 2013 |
| Grant date | Aug 11, 2015 |
| Priority date | — |
| Expiry date | Mar 30, 2033 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61F2009/00897
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.