Measurement system of a light source in space
US9103661B2 · kind B2 · utility
1Cited by
9References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 14, 2011 |
| Grant date | Aug 11, 2015 |
| Priority date | — |
| Expiry date | Dec 8, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01S3/7835
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system measures the position of a light source in space using an imager and transparent surface with a pattern on top. The pattern consists of a repetitive pattern and a distinctive element. The system achieves sub-micron precision. It also handles the measurement of several light sources simultaneously, and the measurement of the position of a retroreflector instead of the light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.