Optical projection system

US9104016B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Johannes Rau · Gerstetten, DE
• Armin Schoeppach · Aalen, DE
• Bernhard Gellrich · Aalen, DE
• Jens Kugler · Heubach, DE
• Martin Mahlmann · Heidenheim, DE
• Bernhard Geuppert · Lauchheim, DE
• Thomas Petasch · Aalen, DE
• Gerhard Fuerter · Ellwangen, DE

Key dates

• Filing date: Sep 25, 2012
• Grant date: Aug 11, 2015
• Expiry date: May 5, 2033

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70883
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An optical projection system for a microlithography system includes a light path, a first lens unit receiving a first part of the light path, a second lens unit receiving a second part of the light path, and a support unit supporting the first and second lens units. The first and second lens units are elongated lens units including a plurality of lenses. The support unit includes a housing receiving a third part of the light path and enclosing a reflective element. The housing includes first and second interfaces. The first interface is a first support interface supporting the first lens unit. The second interface is a second support interface supporting the second lens unit at a location substantially opposite to the first interface.