System and a method for nano imprinting
US9104948B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 25, 2014 |
| Grant date | Aug 11, 2015 |
| Priority date | — |
| Expiry date | Feb 25, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for creating a highly accurate nanostructure is provided, the method includes: (i) creating a highly accurate nanostructure prototype, wherein the highly accurate nanostructure prototype, when illuminated with a predefined illumination, provides a unique optical pattern; (ii) creating at least one highly accurate nanostructure mold from the highly accurate nanostructure prototype, wherein each highly accurate nanostructure mold enables a creation of a highly accurate nanostructure that is substantially similar to the highly accurate nano structure prototype and which, when illuminated with the predefined illumination, provides the unique optical pattern; and (iii) molding the highly accurate nano structure using the highly accurate nano structure mold, wherein the highly accurate nanostructure, when illuminated with the predefined illumination, provides the unique optical pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.