Textile pattern optimization based on fabric orientation and bias characterization
US9107462B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2012 |
| Grant date | Aug 18, 2015 |
| Priority date | — |
| Expiry date | Oct 3, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2210/16
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
Aspects of the present disclosure provide computer implemented techniques to generate textile patterns that are optimized according to a predicted fabric behavior in different orientations. By orienting a “bias” of a fabric based on a number of textile panels being produced from the fabric, the textile panels can be configured to take full advantage of the fabric's properties. Orientation parameters for positioning the panels may be calculated to maximize the number of panels that can be cut from the fabric. Automatic adjustments may be made to the parameters by analyzing the fabric's constraints. The user can also input these constraints and an amount of desired stretch in specific areas of the fabric. A mechanism may also be employed to create a 3D model covered by the fabric in order to further adjust the fabric's orientation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.