Patent · US Active

Silica membrane and method for manufacturing the same

US9108166B2 · kind B2 · utility

0Cited by
2References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 14, 2011
Grant dateAug 18, 2015
Priority date
Expiry dateApr 17, 2034

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB01D2325/28
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

There is provided a silica membrane 1 formed on a porous substrate. A desorbed ionic strength of water having a temperature of 500° C. in a temperature-programmed desorption analysis of water of the silica membrane is 2,000,000/g. The silica membrane 1 is manufactured by allowing a silica sol having a water concentration of 0.03 to 3 mass % to adhere to a porous substrate by an ethanol solvent, drying the silica sol by sending air having a dew point of −70 to 0° C., and firing the dried silica sol at 200 to 400° C.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.