Method for depositing a layer on the surface of a substrate
US9108219B2 · kind B2 · utility
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5References
14Claims
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Key dates
| Filing date | Jul 12, 2011 |
| Grant date | Aug 18, 2015 |
| Priority date | — |
| Expiry date | Apr 6, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05D2203/35
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for depositing a layer on at least part of the surface of a substrate by at least partially submerging the substrate in a solution having a solvent and at least one compound intended to form the layer, then drying the substrate, the drying being at least partially carried out in an atmosphere that is isolated from the solution. The submersion in the solution and the drying of the substrate are carried out in the same controlled-atmosphere enclosure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.