Photoresist film and manufacturing method for organic light emitting display device using the same
US9108451B2 · kind B2 · utility
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11Claims
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Key dates
| Filing date | Oct 23, 2012 |
| Grant date | Aug 18, 2015 |
| Priority date | — |
| Expiry date | Jul 13, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P70/50
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.