Method and system for detecting defects of transparent substrate
US9110035B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 14, 2010 |
| Grant date | Aug 18, 2015 |
| Priority date | — |
| Expiry date | May 1, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8825
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and a system for detecting defects of a transparent substrate are provided. The system includes: a plurality of detection channels, each of which includes an illumination component for providing illumination to the substrate and an imaging component for scanning the substrate to provide image of the substrate; a transport module, for producing relative motion between the substrate and the illumination components and the imaging components included in the plurality of detection channels; and a controlling module, for controlling the illumination components and the imaging components included in the plurality of detection channels so that at least two illumination components of the illumination components included in the plurality of detection channels provide illumination to the substrate alternately, and the imaging component included in any of the plurality of detection channels scans the substrate when the illumination component included in that detection channel illuminates the substrate, wherein the imaging components included in at least two detection channels of the plurality of detections channels are the same imaging component. The method and system described by th…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.