Asymmetric pattern projection apparatus
US9110038B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 18, 2011 |
| Grant date | Aug 18, 2015 |
| Priority date | — |
| Expiry date | May 9, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/2513
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for inspection of a surface of a device comprises a projection module operative to project a pattern along a projection axis of the projection module onto the device. An imaging module receives an image of the pattern reflected from the device along an imaging axis of the imaging module onto an image sensor. A lens comprised in the imaging module has a first magnification in a first direction orthogonal to the imaging axis and a second magnification different from the first magnification in a second direction orthogonal to both the first direction and the imaging axis, which produces different fields of view of the image sensor and resolutions of the image in the first and second directions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.