Method of manufacturing optical waveguide
US9110237B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 6, 2011 |
| Grant date | Aug 18, 2015 |
| Priority date | — |
| Expiry date | Mar 7, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7042
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing an optical waveguide is provided which enables a recognition device such as a CCD camera to easily recognize an alignment mark for positioning a mold for over cladding layer formation. The method includes the steps of: forming protruding cores and a protruding alignment mark on an upper surface of an under cladding layer on a substrate by a photolithographic method; and forming the over cladding layer by use of the mold positioned using the alignment mark as a guide. For the formation of the alignment mark, a photomask is used which has an opening pattern for alignment mark formation including an opening, and a light transmission amount reduction region provided around the opening and having an aperture ratio within a range greater than 10% and less than 80%. The alignment mark is formed to have a peripheral side surface in the form of an inclined surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.