Sensor stack venting
US9111703B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 16, 2012 |
| Grant date | Aug 18, 2015 |
| Priority date | — |
| Expiry date | May 17, 2033 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49826
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Sensor stack venting techniques are described. In one or more implementations, one or more vent structures are formed within layers of a pressure sensitive sensor stack for a device. Vent structures including channels, holes, slots, and so forth are designed to provide pathways for gas released by feature elements to escape. The pathways may be arranged to convey outgases through the layers to designated escape points in a controlled manner that prevents deformities typically caused by trapped gases. The escape points in some layers enable at least some other layers to be edge-sealed. Pathways may then be formed to convey gas from the edge-sealed layer(s) to an edge vented layer(s) having one or more escape points, such that feature elements in the edge-sealed layer(s) remain protected from contaminants.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.