Substrate processing apparatus and substrate processing method
US9111966B2 · kind B2 · utility
2Cited by
1References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2012 |
| Grant date | Aug 18, 2015 |
| Priority date | — |
| Expiry date | Aug 7, 2033 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B1/30
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate processing apparatus comprising: a substrate holder which holds a substrate having a pattern formed in a surface of the substrate in a predetermined positional relationship with a reference indicator of the substrate; and a cleaner which abuts an adhesive member on the surface of the substrate which is held by the substrate holder and peels off the adhesive member along the surface of the substrate in a peeling direction which is not at right angle to a direction of the pattern, thereby cleaning the surface of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.