Patent · US Active

Method for producing an optoelectronic component, and optoelectronic component

US9112165B2 · kind B2 · utility

1Cited by
4References
26Claims
0Family size

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Key dates

Filing dateNov 20, 2012
Grant dateAug 18, 2015
Priority date
Expiry dateNov 20, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50

Abstract

A method for producing an optoelectronic component may include forming a first electrode on a substrate, forming an organic functional layer structure on the first electrode; forming a second electrode on the organic functional layer structure, forming at least one contact for making contact with the first and/or second electrode, forming an encapsulation layer above the layer structure and the contact, removing the encapsulation layer above the contact with the aid of an anisotropic etching method, and cooling the substrate during the anisotropic etching method.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.