Position monitoring system with reduced noise
US9115975B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 3, 2013 |
| Grant date | Aug 25, 2015 |
| Priority date | — |
| Expiry date | Nov 21, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2290/60
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An interferometry system for monitoring changes in the position of an object, the system includes a spectrally broadband light source, a sensor module having an interferometer that direct portions of the light received from the source along separate paths. The system includes an intensity monitor having a detector configured to measure the intensity of additional light derived from the source and to produce a monitor output signal. The system includes an electronic processing module to process a sensor output signal based on the monitor output signal to account for intensity fluctuations in light output by the source, and determine information about the changes in the position of the object. The intensity monitor is configured to characterize the intensity fluctuations as a function of wavelength or intensity fluctuations that are spectrally correlated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.