Resist underlayer polymer, resist underlayer composition including the same, and method of patterning using the same
US9116429B2 · kind B2 · utility
2Cited by
7References
18Claims
0Family size
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Key dates
| Filing date | Sep 21, 2010 |
| Grant date | Aug 25, 2015 |
| Priority date | — |
| Expiry date | Feb 26, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G2261/76
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist underlayer polymer, a resist underlayer composition including the same, and a method of patterning using the same, the resist underlayer polymer including a repeating unit represented by at least one of Chemical Formula 1 and Chemical Formula 2:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.