Plasma catalyst chemical reaction apparatus
US9117636B2 · kind B2 · utility
8Cited by
25References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 16, 2014 |
| Grant date | Aug 25, 2015 |
| Priority date | — |
| Expiry date | Jan 16, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32541
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma device is disclosed. The plasma device includes: at least one electrode including a nanoporous dielectric layer disposed on at least a portion thereof, the nanoporous dielectric layer including a plurality of pores, wherein at least a portion of the plurality of pores include a catalyst embedded therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.