Patent · US Active

Polymeric microgels for chemical mechanical planarization (CMP) processing

US9120952B2 · kind B2 · utility

3Cited by
3References
12Claims
0Family size

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Key dates

Filing dateOct 29, 2007
Grant dateSep 1, 2015
Priority date
Expiry dateSep 7, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/31053
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

Organic-inorganic composites were prepared as colloidal particles of a cross-linked, thermally responsive polymer. Hybrid PNIPAM-polysiloxane particles and composite polymeric particles with embedded nanoparticles of an inorganic metal-oxide (MOx) such as CeO2 and TiO2 were formed. To promote the incorporation of unaggregated nanoparticles, temperature responsive microspherical gels (microgels) of N-isopropylacrylamide (NIPAM) with interpenetrating (IP) linear chains of poly(acrylic acid) (PAA) were used. The organic-inorganic composition of the hybrid polymer network was controlled by changing the time for condensation and hydrolysis of the siloxane monomer during synthesis. Experimental results indicated that the planarization of silicon oxide wafers using these hybrid particles and composites exhibited lower topographical variations and surface roughness as compared to slurries consisting of only silica or ceria nanoparticles while achieving similar removal rates and better or similar frictional characteristics.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.