Display substrate and method of measuring pattern dimensions of display substrate
US9123276B2 · kind B2 · utility
1Cited by
1References
8Claims
0Family size
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Key dates
| Filing date | Mar 15, 2013 |
| Grant date | Sep 1, 2015 |
| Priority date | — |
| Expiry date | Aug 6, 2033 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70625
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A display panel includes a plurality of pixel areas and at least one inspection area. An incident light is irradiated onto an inspection pattern disposed in the inspection area and a reflection light reflected by the inspection pattern is detected. An optical critical dimension of the inspection pattern is calculated from the reflection light, and a dimension of a pixel pattern disposed in each pixel area is calculated from the optical critical dimension of the inspection pattern. Accordingly, the dimension of the pixel pattern may be indirectly measured from the inspection pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.