Patent · US Active

In-line metrology system

US9123584B2 · kind B2 · utility

0Cited by

33References

14Claims

0Family size

Assignee

First Solar, Inc. · US

Inventors

Arnold Allenic · San Jose, US
Stephan Paul George, II · Perrysburg, US
Sreenivas Jayaraman · Maumee, US
Oleh Karpenko · San Jose, US
Chong Lim · Perrysburg, US

Key dates

Filing date	Nov 5, 2013
Grant date	Sep 1, 2015
Priority date	—
Expiry date	Nov 5, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2924/0002
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

A metrology system for gauging and spatially mapping a semiconductor material on a substrate can be used in controlling deposition and thermal activation processes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.