Anti-reflection film and method for manufacturing the same
US9127171B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 8, 2011 |
| Grant date | Sep 8, 2015 |
| Priority date | — |
| Expiry date | Jul 8, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24942
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Disclosed is an anti-reflection film comprising a high refractive index layer comprising a first binder including a crosslinked polymer of a multifunctional (meth)acrylate compound, and nano silica particles dispersed in the first binder; and a low refractive index layer laminated on the high refractive index layer, and comprising a second binder including a crosslinked copolymer of a multifunctional (meth)acrylate compound and a fluorine-based (meth)acrylate compound, and hollow silica particles and hollow silica particles coated with a fluorine-based compound on the surface, which are dispersed in the second binder, wherein the weight ratio of the hollow silica particles to the hollow silica particles coated with a fluorine-based compound is 1:1˜10. Also disclosed is a method for manufacturing the anti-reflection film using a composition that is separated into at least two layers by phase separation after single layer coating by a more simplified process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.